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Direct TEM study of the roughening of SiO 2 /Si interface induced during AES depth profiling
Author(s) -
Barna P. B.,
Gosztola L.,
Zalar A.,
Rasigni M.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090512
Subject(s) - chinese academy of sciences , research centre , library science , engineering physics , technical university , physics , materials science , engineering , computer science , political science , law , china