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Analysis of plasma enhanced chemical vapour deposition‐grown Borophosphosilicate glass with a combination of Rutherford backscattering and elastic recoil detection
Author(s) -
Oude Elferink J. B.,
Dunselman K.,
Evers E. J.,
Habraken F. H. P. M.,
Van Der Weg W. F.,
Holsbrink J.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090505
Subject(s) - elastic recoil detection , rutherford backscattering spectrometry , homogeneous , rutherford scattering , analytical chemistry (journal) , chemical vapor deposition , recoil , deposition (geology) , ion beam analysis , thin film , chemistry , ion , plasma , materials science , ion beam , atomic physics , scattering , nuclear physics , optics , physics , nanotechnology , biology , paleontology , neutron scattering , chromatography , thermodynamics , organic chemistry , sediment , small angle neutron scattering
It is shown that with a combination of high energy ion beam methods, Rutherford backscattering spectrometry and elastic recoil detection, the elemental composition of borophosphosilicate glass (SiO p P q B r N s H t ) can be determined without reference to an external standard. Both thin (< 100 nm) and thick films can be analysed, provided the latter are homogeneous over the layer thickness. Some results pertinent to the B and P uptake during the deposition are briefly discussed.