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Applications of SIMS, SAES and XPS to problems in the semiconductor industry
Author(s) -
Alnot P.,
Huber A. M.,
Olivier J.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090504
Subject(s) - x ray photoelectron spectroscopy , interface (matter) , semiconductor industry , semiconductor , materials science , analytical chemistry (journal) , engineering physics , chemistry , optoelectronics , chemical engineering , environmental chemistry , engineering , composite material , manufacturing engineering , capillary number , capillary action
Electronic devices based on III‐V compounds can be significantly affected in their behaviour by surface and interface properties. This paper will show the usefulness of surface and interface analytical tools such as SIMS, SAES and XPS in overcoming such problems. Case studies in relation with some of the main problems of III‐V compounds technologies will be described.