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Measurement of the sputtering yield with a 3d stylus surface mapping system: application to copper and α‐brass
Author(s) -
Quantin J. C.,
DarqueCeretti E.,
Combarieu R.,
Delamare F.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090208
Subject(s) - stylus , brass , sputtering , copper , yield (engineering) , materials science , metallurgy , computer science , nanotechnology , thin film , computer vision
This paper present a method for determing the sputtering yield of a material bombarded by an ion beam, using a 3D stylus surface mapping system. Data obtained of copper are discussed. The influences on the sputtering yield of progressive addition of zinc is observed. The results are in good agreement with previous theoretical results.