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Distribution of hydrogen in the NPL standard ta 2 O 5 films
Author(s) -
Bishop H. E.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090205
Subject(s) - tantalum , hydrogen , analytical chemistry (journal) , argon , oxide , elastic recoil detection , oxygen , metal , tantalum pentoxide , materials science , chemistry , metallurgy , organic chemistry , chromatography
The NPL has produced well characterized tantalum pentoxide anodized films for use as a thickness and depth resolution standard for profiling in surface analytical techniques. Very sharp interfaces for these films have been demonstrated using AES. Studying these films by dynamic SIMS in the CAMECA IMS 3F, well defined profiles with a sharp interface were obtained with an oxygen primary beam. More complex profiles were obtained with argon and caesium primary beams, apparently showing the presence of hydroxide at the metal/oxide interface and a high concentration of hydrogen in the metal near the surface. However an argon primary beam with an oxygen flood gave the same type of profile as that obtained with an oxygen primary beam. Elastic Recoil Detection Analysis confirmed that there was no high concentration of hydrogen at the metal‐oxide interface and showed that hydrogen in the tantalum was present at 1 at %.