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X‐Ray diffraction investigations on ultra‐thin gold films
Author(s) -
Häupl K.,
Lang M.,
Wissmann P.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740090106
Subject(s) - diffraction , materials science , thin film , microbeam , limiting , optics , epitaxy , analytical chemistry (journal) , chemistry , nanotechnology , physics , layer (electronics) , chromatography , mechanical engineering , engineering
The structure of epitaxially grown ultra‐thin gold films is investigated by x‐ray diffraction, texture analysis and LEED/Auger techniques. High sensitivity of the x‐ray diffraction analyzer has been achieved by means of a step scanning unit and an impulse height discriminator. The resolving power is then sufficient for the detection of the reflections of films as thin as 1 nm. It is concluded that the particle size broadening is the limiting factor for a further extension of the investigation range towards smaller thicknesses.