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Determination of depth resolution from measured sputtering profiles of multilayer structures: Equations and approximations
Author(s) -
Hofmann S.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740080209
Subject(s) - resolution (logic) , sputtering , range (aeronautics) , materials science , layer (electronics) , computational physics , high resolution , analytical chemistry (journal) , optics , chemistry , geology , physics , remote sensing , thin film , computer science , composite material , chromatography , nanotechnology , artificial intelligence
Equations to extract the depth resolution from measured sputtering profiles of multilayer structures are presented. The range of application and the errors involved are discussed with respect to the ratio between depth resolution and layer thickness.