Premium
Quantitative Auger electron spectroscopy for refractory metal silicides
Author(s) -
Wirth Th.,
Procop M.,
Lange H.
Publication year - 1986
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740080103
Subject(s) - auger electron spectroscopy , sputtering , recoil , analytical chemistry (journal) , metal , matrix (chemical analysis) , materials science , superposition principle , spectroscopy , electron , auger , refractory metals , atomic physics , chemistry , metallurgy , thin film , nuclear physics , physics , nanotechnology , chromatography , quantum mechanics , composite material
Quantitative AES analysis is carried out on Cr–Si and Mo–Si systems. The treatment is based on the introduction of matrix and sputter correction factors. The matrix correction factors are calculated along the lines outlined in literature and proved to be weakly dependent on composition. Comparison with experimental data obtained on scratched surfaces of MoSi 2 and Cr 3 Si bulk samples showed good agreement between experimental and nominal composition ratios. The sputter correction factors were found to be strongly dependent on composition for both systems. Comparison with theory for the case of preferential sputtering as the dominant ejection mechanism yields agreement with the experiment only for samples with low Si content. This is believed to be due to superposition with recoil location of the heavier component.