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Study of emission and sputtering yields in some alloys and oxide by glow discharge optical spectrometry: Quantification of analysis
Author(s) -
PonsCorbeau J.
Publication year - 1985
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740070404
Subject(s) - glow discharge , sputtering , analytical chemistry (journal) , oxide , mass spectrometry , yield (engineering) , matrix (chemical analysis) , emission intensity , materials science , chemistry , metal , ionic bonding , ion , thin film , luminescence , optoelectronics , nanotechnology , plasma , metallurgy , composite material , physics , organic chemistry , chromatography , quantum mechanics
In an analysis by glow discharge optical spectrometry (GDOS) the relation between the intensity of spectral emission of an element and its concentration at the surface of the sample is fundamental for interpreting the results. The different factors which occur in this relation are systematically investigated for different materials such as metallic alloys, oxidized matrices or matrices submitted to ionic implantation. The measurements show that the emission yield of an element is independent of the matrix although particular phenomena can affect the apparent experimental values. The simplification which results in the interpretation of experiments in GDOS is evident and a few examples of applications are presented.