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Correlation between CdS photoanodic behaviour and electrode chemical modifications: An X‐ray photoelectron spectroscopic study
Author(s) -
Riga J.,
Verbist J. J.,
Josseaux P.,
Kirschde Mesmaeker A.
Publication year - 1985
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740070403
Subject(s) - photosensitivity , x ray photoelectron spectroscopy , photocurrent , electrode , chemistry , layer (electronics) , x ray , spectral line , photoelectrochemistry , analytical chemistry (journal) , photochemistry , materials science , inorganic chemistry , optoelectronics , optics , electrochemistry , chemical engineering , organic chemistry , physics , astronomy , engineering
The photosensitivity increase of CdS films as a function of the illumination time, is correlated to chemical changes of the electrode surface, analysed by XPS. It is shown that the formation of Cd(OH) 2 or CdO is responsible for the photosensitivity change of the illuminated electrode in contact with H 2 O/NaOH alone. When thiocresol or p ‐mercaptobenzoic acid is added as reductant, a layer of organic compounds is formed on the electrode during the photoelectrochemical process. However, the XPS and photocurrent spectra indicate that this layer does not prevent the occurrence of Cd(OH) 2 or CdO responsible for the photosensitivity changes of the CdS film.