Premium
Ion induced surface compositional changes of α brass; a comparative study by AES and sputtered thermal ion mass spectrometry. Application to quantitative AES
Author(s) -
DarqueCeretti E.,
Delamare F.,
Blaise G.
Publication year - 1985
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740070306
Subject(s) - sputtering , mass spectrometry , auger electron spectroscopy , chemistry , analytical chemistry (journal) , fast atom bombardment , ion , auger , static secondary ion mass spectrometry , secondary ion mass spectrometry , brass , x ray photoelectron spectroscopy , materials science , atomic physics , thin film , copper , chromatography , nuclear magnetic resonance , physics , organic chemistry , nuclear physics , nanotechnology
Abstract Surface concentrations and sputtered‐off atom concentrations of α brass are measured during ion bombardment, respectively by Auger spectroscopy and by a new quantitative sputtered thermal ion mass spectrometry method. A new formulation of the problem of surface composition change is proposed which leads to a definition of matrix effect coefficients, sputter elemental yields and a sputter correction factor μ, connecting surface concentrations to sputtered‐off atom concentrations. Implications in quantitative analysis by Auger spectroscopy or any mass spectrometry technique are discussed.