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Calibration of argon ion sputter rates using nuclear microanalysis and Auger spectroscopy
Author(s) -
Tapping R. L.,
Davidson R. D.,
Jackman T. E.
Publication year - 1985
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740070209
Subject(s) - auger electron spectroscopy , sputtering , microanalysis , argon , analytical chemistry (journal) , auger , spectroscopy , ion , chemistry , materials science , thin film , atomic physics , nanotechnology , nuclear physics , physics , organic chemistry , chromatography , quantum mechanics
Auger electron spectroscopy (AES), in conjunction with argon ion sputtering, is frequently used to obtain composition versus depth profiles. Thin film thicknesses may be estimated from such profiles if the argon ion sputtering rate of a particular material is known. For this work, a series of oxide standards was prepared and calibrated with nuclear microanalysis techniques. These standards were then used to calibrate the composition versus depth profiles obtained using AES.