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On the influence of sample temperature on depth resolution in sputtering
Author(s) -
Kühlein Maria,
Jäger Ingomar
Publication year - 1984
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740060305
Subject(s) - resolution (logic) , sputtering , analytical chemistry (journal) , materials science , copper , range (aeronautics) , atmospheric temperature range , layer (electronics) , chemistry , mineralogy , composite material , metallurgy , thin film , nanotechnology , thermodynamics , chromatography , physics , artificial intelligence , computer science
Evaporated silver layers of varying thickness on poly‐crystalline copper substrates were sputtered off at different temperatures. The relation between depth resolution and sample temperature at different layer thickness was investigated. It turned out that raising the temperature from 298 K to 423 K results in a significant improvement of Δ z whereas at 498 K the depth resolution is—although better than at 298 K—poorer again. Within the investigated range of depth Δ z varies like Δ z ∞ z 5/6 for all temperatures thus indicating a strong deviation from the SLS model.