Premium
Secondary ion emission of metal oxide species and their dependence on the fragment valence
Author(s) -
Van Craen Marc J.,
Adams Fred C.
Publication year - 1983
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740050604
Subject(s) - valence (chemistry) , metal , ion , oxide , chemistry , metal ions in aqueous solution , analytical chemistry (journal) , atomic physics , inorganic chemistry , physics , organic chemistry , chromatography
Secondary ion yields for dynamic SIMS analysis of oxidized metal and metal oxide surfaces were determined. The dependence of the ion yield with the fragment valence for molecular secondary ion species of the M x O y ± type can be described by a Gaussian, whose width and maximum decreases with the number of metal atoms in the cluster. The systematics of parameters, such as the variance of the Gaussian, the total ion yield, the lattice valence and its shift with the oxidation state of the metal in the solid, were investigated. The practical use of the derived relationships is demonstrated.