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Quantitative determination of the kinetics of the reaction of NiO and Al 2 O 3 to NiAl 2 O 4 by Rutherford backscattering
Author(s) -
De Roos G.,
Fluit J. M.,
Velthuizen R. P.,
De Wit J. H. W.,
Geus J. W.
Publication year - 1983
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740050308
Subject(s) - nial , non blocking i/o , activation energy , nucleation , analytical chemistry (journal) , diffusion , chemical kinetics , ion , spinel , materials science , reaction rate , kinetics , chemistry , intermetallic , thermodynamics , metallurgy , physics , biochemistry , organic chemistry , alloy , chromatography , quantum mechanics , catalysis
A quantitative evaluation of RBS data resulted in data for the parabolic reaction rate constants for the reaction between Al 2 O 3 and NiO at temperatures from 960°C up to 1105°C. The activation energy and the preexponential factor were in good agreement with literature data. The experimental data of this work also permitted a detailed description of reaction mechanisms on a microscopic level. The reaction between Al 2 O 3 and NiO starts with penetration of Al 3+ ions along the grain boundaries of NiO, followed by counter‐diffusion of Ni 2+ ions. A thin spinel layer (NiAl 2 O 4 ) is formed at the Al 2 O 3 /NiO interface, after a relatively short nucleation period. The reaction then proceeds, both by lateral and perpendicular diffusion. In an appendix, the detailed evaluation procedure of the spectra was described.