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Quantitative comparison of direct and derivative AES with XPS of metal sulfides
Author(s) -
Griffis Dieter P.,
Linton Richard W.
Publication year - 1982
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740040505
Subject(s) - x ray photoelectron spectroscopy , stoichiometry , analytical chemistry (journal) , chemistry , auger electron spectroscopy , sulfide , metal , auger , derivative (finance) , atomic physics , nuclear magnetic resonance , physics , organic chemistry , chromatography , nuclear physics , financial economics , economics
Integral area measurements of Auger intensities for various metal sulfides give comparable quantitative results to those obtained from derivative peak‐to‐peak heights. Highest precisions for sulfur sensitivity factors were obtained by: (a) intensity measurements involving integration of background‐subtracted N(E) lineshapes, (b) matrix corrections for electron mean free path and backscattering factor, (c) the use of XPS‐derived surface stoichiometries rather than assumed bulk stoichiometries for the metal sulfide standards. Despite the inherent inaccuracies of XPS quantitation, the XPS results help to correct for surface deviations from bulk stoichiometry owing to surface contamination, facile S surface oxidation, and preferential S loss usually observed during Ar + sputter cleaning. The integral area Auger measurement techniques are particularly promising for electron‐beam sensitive materials which often cannot be characterized using high primary electron doses and conventional energy‐analyzer potential modulation differentiation.