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Correction factors and sputtering effects in quantitative auger electron spectroscopy
Author(s) -
Holloway Paul H.,
Hofmeister Susan K.
Publication year - 1982
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740040502
Subject(s) - sputtering , auger electron spectroscopy , auger , argon , neon , atomic physics , spectroscopy , ion , electron spectroscopy , auger effect , recoil , chemistry , analytical chemistry (journal) , materials science , thin film , nanotechnology , physics , nuclear physics , organic chemistry , quantum mechanics , chromatography
Quantification of Auger electron spectroscopy data from silver‐gold binary alloys has been studied. It is shown that the Auger data accurately reflect the bulk composition of scribed surfaces when the intensities of elemental standards are corrected for variations in the atomic density, electron escape depth and backscatter factor. It is also shown that gold is enriched in the surface region during sputtering with either argon or neon ions but the enrichment is less when sputtered at 110 K than at 300 K. Transients are observed in the concentration of gold and silver in the surface region when the ion energy is changed from 500 eV to 2000 eV. These sputtering effects (commonly called preferred sputtering) are interpreted as resulting from a combination of recoil implantation and surface segregation.