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Fast atom bombardment mass spectrometry for applied surface analysis
Author(s) -
Surman D. J.,
van den Berg J. A.,
Vickerman J. C.
Publication year - 1982
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740040407
Subject(s) - fast atom bombardment , mass spectrometry , secondary ion mass spectrometry , static secondary ion mass spectrometry , elemental analysis , ion , chemistry , insulator (electricity) , electron bombardment , analytical chemistry (journal) , atom (system on chip) , atomic physics , surface structure , materials science , molecular physics , inorganic chemistry , physics , optoelectronics , organic chemistry , chromatography , computer science , embedded system
Fast atom bombardment mass spectrometry permits the detection of secondary ions from surfaces of insulator materials without the necessity for charge neutralization of the surface by electron bombardment. It thus opens the possibility of routine mass spectral analysis of surfaces yielding data concerning not only their elemental composition but also their chemical structure. The possibilities are illustrated from examples of the analysis of glass and catalyst surfaces.