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Behaviour of water containing materials in the high vacuum of an X‐ray photoelectron spectrometer
Author(s) -
Hirokawa K.,
Danzaki Y.
Publication year - 1982
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740040207
Subject(s) - x ray photoelectron spectroscopy , ultra high vacuum , analytical chemistry (journal) , chemistry , torr , spectrometer , water vapor , high pressure , x ray , water pressure , nuclear chemistry , materials science , chemical engineering , environmental chemistry , organic chemistry , nanotechnology , optics , physics , engineering physics , engineering , thermodynamics , mining engineering
In order to examine the behaviour of water containing materials in the high vacuum of an electron spectrometer, semi‐quantitative XPS measurements of the atomic ratio of O to an element in certain inorganic compounds were carried out. Materials investigated were CuSO 4 ·5H 2 O, KCr(SO 4 ) 2 ·12H 2 O, FeC 2 O 4 ·2H 2 O, Sn(OH) 2 , Al(OH) 3 , Fe(OH) 3 , Ti(OH) 4 , Zn(OH) 2 , Zr(OH) 4 and some metals. It can be anticipated from the correlation between the vapour pressure, of water and temperature that water containing materials, which are dehydrated under 400 °C at normal pressure, lose water under a vacuum of about 10 −8 Torr. Of course, it became clear that measurements of water containing materials in the high vacuum should be performed very carefully.