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Shading at different take‐off angles in X‐ray photoelectron spectroscopy
Author(s) -
Ebel Maria F.,
Wernisch J.
Publication year - 1981
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740030502
Subject(s) - shading , x ray photoelectron spectroscopy , surface finish , x ray , surface roughness , compensation (psychology) , optics , materials science , physics , computer science , nuclear magnetic resonance , computer graphics (images) , psychology , psychoanalysis , composite material
Results of quantitative X‐ray photoelectron spectroscopic analysis are influenced by thin overlayers. Therefore, the reduced thickness of these layers has to be determined to allow a compensation to be made for this influence. An applicable method is based on the variation of the take‐off angle. In this paper the angular dependence of the photoelectron count rate caused by surface roughness is discussed. It is created mainly by X‐ray shading. As a consequence of these considerations the ultimate roughness depth can be given up to where the angular response of the count rate is not affected by X‐ray shading and thus the method of the variable take‐off angle can be applied.