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The significance of reduced thicknesses determined by XPS using the variable take‐off angle technique
Author(s) -
Ebel Maria F.
Publication year - 1981
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740030407
Subject(s) - overlayer , x ray photoelectron spectroscopy , substrate (aquarium) , analytical chemistry (journal) , oxide , materials science , sample (material) , chemistry , physics , nuclear magnetic resonance , metallurgy , geology , chromatography , oceanography
The results of quantitative XPS analysis show a systematic change when the sample surface is covered by an overlayer. An accurate knowledge of the reduced thickness ( x ) of the total overlayer (e.g. oxide plus contamination) allows the quantification of such changes. The total reduced thickness ( x ) can be determined from the photoelectron signals of the substrate measured for different take‐off angles. It is found that this method can be applied for reduced thicknesses up to x = 3 with an error Δ x estimated at less than 10%.