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Probing the influence of thin overlayers on the results of quantitative XPS analysis without reference samples
Author(s) -
Ebel Maria F.
Publication year - 1980
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740020504
Subject(s) - x ray photoelectron spectroscopy , monolayer , analytical chemistry (journal) , oxide , materials science , contrast (vision) , quantitative analysis (chemistry) , chemistry , nanotechnology , physics , optics , environmental chemistry , metallurgy , nuclear magnetic resonance
In contrast to physical methods with large information depths, the results of quantitative XPS analysis are strongly influenced by oxide and/or contamination overlayers with a thickness of 1‐2 monolayers. A new method is introduced which allows the determination of a value d/(Λ ref cos ε)without the application of the variable take‐off angle technique. The significance of the results and their associated errors are discussed.