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A correlation of the average sample mass and the sputtering yield in SIMS
Author(s) -
Katz William,
Williams Peter,
Evans C. A.
Publication year - 1980
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740020308
Subject(s) - sputtering , yield (engineering) , substrate (aquarium) , analytical chemistry (journal) , secondary ion mass spectrometry , ion , stoichiometry , chemistry , materials science , thin film , metallurgy , nanotechnology , chromatography , oceanography , organic chemistry , geology
Previous work has shown that the sputtering yield of a matrix strongly affects the secondary ion yield of a material bombarded by reactive primary ions. Examining several homologous series of compounds, we have determined a linear correlation between sputtering yield and average substrate mass. This relationship enables quantitative predictions of the substrate sputtering yield and stoichiometry prior to SIMS analysis. This approach should be generally applicable to any sputtering technique.