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X‐ray photoelectron study of thin evaporated films of Fe/Ni alloy
Author(s) -
Nefedov V. I.,
Pozdeyev P. P.,
Dorfman V. F.,
Pypkin B. N.
Publication year - 1980
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740020106
Subject(s) - alloy , materials science , sputtering , substrate (aquarium) , x ray photoelectron spectroscopy , analytical chemistry (journal) , thin film , layer (electronics) , ion , metallurgy , chemistry , composite material , chemical engineering , nanotechnology , oceanography , organic chemistry , chromatography , geology , engineering
Thin evaporated films of Fe/Ni alloy on a SiO 2 substrate were studied by means of ESCA. Depth‐composition profiles during ion sputtering and angular dependences of peak intensities upon take‐off angle of electrons were measured. The calibration curve for the ratio of intensities I Fe 3p / I Ni 3p vs. bulk alloy composition was plotted. The uppermost layer of the film at the air/FeNi interface was enriched with Fe oxides. The next layer was slightly depleted of Fe atoms. At the FeNi/SiO 2 interface the relative Fe and Ni content was the same as in the bulk of the film down to the layers of no more than 10 Å thickness. The approach to SiO 2 during sputtering of the last thin layers of the film was accompanied by formation of charged Fe/Ni alloy islands on SiO 2 which led to splitting of the Fe, Ni, Si, O and C lines. The width of the FeNi/SiO 2 transition zone created by ion bombardment was about 35–50 Å for films of 100–200 Å thickness.