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Mean free path for inelastic scattering of 1.2 kev electrons in thin poly(methylmethacrylate) films
Author(s) -
Roberts R. F.,
Allara D. L.,
Pryde C. A.,
Buchanan D. N. E.,
Hobbins N. D.
Publication year - 1980
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740020103
Subject(s) - x ray photoelectron spectroscopy , inelastic mean free path , electron , mean free path , materials science , range (aeronautics) , scattering , inelastic scattering , excited state , analytical chemistry (journal) , atomic physics , polymer , binding energy , electron spectroscopy , chemistry , physics , optics , nuclear magnetic resonance , organic chemistry , quantum mechanics , composite material
Mean free paths for inelastic scattering (λ) of low energy electrons in poly(methylmethacrylate) (PMMA) have been determined by measuring Al Kα excited C 1s and Si 2s photoelectron signal intensities as a function of ellipsometrically determined thicknesses of PMMA overlayers on silicon substrates. The λ values obtained are 29 ± 4 Å for 1196 eV electrons and 33 ± 5 Å for 1328 eV electrons. These data are necessary for the quantitative analysis of the surface region of PMMA and similar polymers by X‐ray photoelectron spectroscopy (XPS). The magnitude of the λ values determined indicates that XPS measurements can provide chemical information about the surface region of polymers, such as PMMA, in the depth range of ∼6 to 100 Å. The results of this study are compared and discussed with respect to λ values determined for other organic compounds.