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Quantitative XPS analysis without reference samples
Author(s) -
Ebel Maria F.
Publication year - 1979
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740010204
Subject(s) - x ray photoelectron spectroscopy , overlayer , ternary operation , quantitative analysis (chemistry) , analytical chemistry (journal) , chemistry , materials science , computer science , physics , nuclear magnetic resonance , environmental chemistry , programming language
For approximately ten years there has existed a theoretically based concept of fundamental parameters for XRFA (quantitative X‐ray fluorescence analysis). From a comparison of the differences specific for XRFA and XPS it can be learned that this concept is also applicable to XPS and allows quantitative analysis without reference samples. Additionally, the influence of an overlayer on analytical XPS results is discussed. The theoretical considerations are confirmed by a series of measurements performed on binary and ternary alloys of Ag/Au/Cu and the results are compared with those of earlier measurements with reference samples. An averaged absolute accuracy of approximately ±2 wt% has been found for both methods, but the advantage of an absolute method needs no further comment.