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Thickness measurements on layered materials in powder form by means of XPS and ion sputtering
Author(s) -
Cross Y. M.,
Dewing J.
Publication year - 1979
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.740010106
Subject(s) - x ray photoelectron spectroscopy , sputtering , materials science , ion , analytical chemistry (journal) , chemical engineering , chemistry , thin film , nanotechnology , chromatography , organic chemistry , engineering
A model for the quantitative analysis of XPS data from coated spherical particles is described. The limitations of the application of flat surface intensity equations to this system are discussed. The predictions are compared with experimentally derived XPS results for SiO 2 O 3 coated TiO 2 powder samples. Sputtering profiles for these systems are presented and interpreted.