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Surface acoustic wave relative humidity sensor based on sputtering SiO 2 film
Author(s) -
Yan Xiaopeng,
Li Cuiping,
Zhao Lei,
Tian Shuzhen,
Zhang Zeyu,
Li Mingji,
Li Hongji,
Qian Lirong,
Gong Xiaonan,
Huang Yihang,
Hou Tao,
Bai Haibin,
Yang Baohe
Publication year - 2021
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6989
Subject(s) - surface acoustic wave , sputtering , relative humidity , desorption , materials science , hysteresis , humidity , repeatability , adsorption , resonator , surface acoustic wave sensor , thin film , analytical chemistry (journal) , substrate (aquarium) , optoelectronics , chemistry , acoustics , nanotechnology , chromatography , physics , oceanography , organic chemistry , quantum mechanics , geology , thermodynamics
A surface acoustic wave (SAW) relative humidity (RH) sensor was prepared by sputtering SiO 2 sensing film on the total surface of an SAW resonator. The prepared humidity sensor exhibits good linear relationship under wide RH range of 10%–80%. Small hysteresis is observed during the adsorption and desorption processes. The sensitivity of the sensor is −1.14 kHz/% for the adsorption process and −1.06 kHz/% for the desorption process. The sensing mechanism of the sensor can be explained from the mass loading effect of the SiO 2 film. The response time is 6.0 s and the recovery time is 21.3 s when the RH switches between 10% and 70%. Moreover, the SAW sensor also shows good repeatability and stability due to the high adhesion of the sputtering SiO 2 film to the substrate.