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Polymer surface modification using He/O 2 RF remote low‐pressure plasma
Author(s) -
Saloum Saker,
Abou Shaker Samer,
Alwazzeh Moneer,
Hussin Rokayya
Publication year - 2021
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6976
Subject(s) - x ray photoelectron spectroscopy , polymer , polystyrene , materials science , surface modification , polyvinyl chloride , analytical chemistry (journal) , inductively coupled plasma , scanning electron microscope , methyl methacrylate , polyethylene , plasma cleaning , contact angle , etching (microfabrication) , chemical engineering , plasma , chemistry , polymerization , composite material , layer (electronics) , organic chemistry , physics , quantum mechanics , engineering
In this study, He/O 2 plasma mixture, induced in a radio frequency (RF) low‐pressure remote plasma system, has been characterized and employed for polymer surface modification. Actinometry optical emission spectroscopy (AOES) and Langmuir probe techniques were used to evaluate the plasma active species contributing to polymer surface modification. These active species involve the atomic oxygen [O] and the electrons ( n e ). Five different polymers (poly(methyl methacrylate) [PMMA], polytetrafluoroethylene [PTFE], polyethylene [PE], polyvinyl chloride [PVC], and polystyrene [PS]) were plasma treated and subsequently characterized for etching rate, surface morphology using atomic force microscopy (AFM) technique, and chemical elemental composition using X‐ray photoelectron spectroscopy (XPS) technique.