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The electronic band structure analysis of OLED device by means of in situ LEIPS and UPS combined with GCIB
Author(s) -
Terashima Masahiro,
Miyayama Takuya,
Shirao Tetsuro,
Mo Hin Wai,
Hatae Yasuhiro,
Fujimoto Hiroshi,
Watanabe Katsumi
Publication year - 2020
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6777
Subject(s) - x ray photoelectron spectroscopy , indium tin oxide , ultraviolet photoelectron spectroscopy , analytical chemistry (journal) , materials science , substrate (aquarium) , photoemission spectroscopy , in situ , chemistry , thin film , nanotechnology , nuclear magnetic resonance , physics , oceanography , organic chemistry , chromatography , geology
Low‐energy inverse photoelectron spectroscopy (LEIPS) and ultraviolet photoelectron spectroscopy (UPS) incorporated into the multitechnique XPS system were used to probe the ionization potential and the electron affinity of organic materials, respectively. By utilizing gas cluster ion beam (GCIB), in situ analyses and depth profiling of LEIPS and UPS were also demonstrated. The band structures of the 10‐nm‐thick buckminsterfullerene (C 60 ) thin film on Au (100 nm)/indium tin oxide (100 nm)/glass substrate were successfully evaluated in depth direction.