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Summary of ISO/TC 201 Standard: ISO 22415—Surface chemical analysis—Secondary ion mass spectrometry—Method for determining yield volume in argon cluster sputter depth profiling of organic materials
Author(s) -
Shard Alexander G.,
Havelund Rasmus,
Seah Martin P.,
Clifford Charles A.
Publication year - 2019
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6686
Subject(s) - sputtering , argon , yield (engineering) , analytical chemistry (journal) , ion , materials science , volume (thermodynamics) , secondary ion mass spectrometry , mass spectrometry , chemistry , thin film , nanotechnology , chromatography , metallurgy , physics , organic chemistry , quantum mechanics
The International Standard ISO 22415 provides methods to measure sputtering yield volumes of organic test materials using argon cluster ions. The test materials should consist of thin films of known thicknesses between 50 and 1000 nm. The format of the test materials, the measurement of sputtering ion dose, sputtered depth, and reporting requirements for sputtering yield volumes are described.