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Experimental determination of the effective attenuation length of palladium 3d 5/2 photoelectrons in a magnetron sputtered Pd nanolayer
Author(s) -
Dietrich Paul M.,
Treu Dieter,
Kalbe Henryk,
Krumrey Michael,
Gross Thomas,
Marti Kilian,
Unger Wolfgang E. S.
Publication year - 2017
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6141
Subject(s) - photoelectric effect , inelastic mean free path , attenuation , sputtering , substrate (aquarium) , kinetic energy , palladium , materials science , ion , scattering , electron , mean free path , sputter deposition , atomic physics , analytical chemistry (journal) , chemistry , thin film , optics , optoelectronics , physics , nanotechnology , nuclear physics , oceanography , biochemistry , organic chemistry , chromatography , quantum mechanics , geology , catalysis
An electron effective attenuation length (EAL) of 1.68 nm for Al Kα excited Pd 3d 5/2 photoelectrons with a kinetic energy of 1.152 keV has been determined experimentally using a sputtered Pd film deposited on an ultra flat fused quartz substrate. The film thickness was reduced by Ar ion sputtering several times in order to obtain different Pd film thicknesses which are used to determine experimental EAL values. These results are compared to data generated by using a Simulation of Electron Spectra for Surface Analysis (SESSA) simulation using an inelastic mean free path (IMFP) calculated with the Tanuma–Powell–Penn (TPP)‐2M formula and with ‘elastic scattering on and off’. Contributions to the uncertainty budget related to the experimental approach are discussed in detail. Proposals on how to further improve the approach are suggested. Copyright © 2016 John Wiley & Sons, Ltd.