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Using a low‐energy proton beam to cross‐link polymer films for the protection of inorganic substrates
Author(s) -
Zheng Zhi,
Zhao Hongxiao,
Fa Wenjun,
He Weiwei,
Wong Kawai,
Kwok Raymund W.M.
Publication year - 2017
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6065
Subject(s) - microelectronics , substrate (aquarium) , x ray photoelectron spectroscopy , silicon , copper , materials science , polymer , proton , thin film , polymer substrate , chemical engineering , nanotechnology , optoelectronics , metallurgy , composite material , physics , engineering , oceanography , quantum mechanics , geology
Oxidation and corrosion effects on virgin copper and silicon substrates under ambient conditions largely restrict their electronic and microelectronic applications in industrial fields. In this paper, we first aimed to fabricate cross‐linked organic thin films on a copper substrate by bombardment with a low‐energy proton beam, thus enhancing the films' anti‐oxidization ability under ambient conditions, as confirmed using X‐ray photoelectron spectroscopy and atomic force microscopy. The anti‐oxidization ability of the cross‐linked polymer films on silicon substrate was also considered. Copyright © 2016 John Wiley & Sons, Ltd.