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Effect of nitrogen on mechanical, oxidation and structural behaviour of Ti–Si–B–C–N nanocomposite hard coatings deposited by DC sputtering
Author(s) -
Mahato P.,
Singh R. J.,
Pathak L. C.,
Mishra S. K.
Publication year - 2016
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.6030
Subject(s) - nanoindentation , microstructure , materials science , x ray photoelectron spectroscopy , amorphous solid , nanocomposite , sputter deposition , scanning electron microscope , tin , nitrogen , sputtering , deposition (geology) , chemical engineering , analytical chemistry (journal) , composite material , thin film , crystallography , metallurgy , chemistry , nanotechnology , organic chemistry , paleontology , sediment , biology , engineering
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios such as N 2 /Ar = 1 : 5, 2 : 4, 3 : 3, 4 : 1 and 5 : 0. The formation of TiN and TiB phases was observed because of incorporation of nitrogen. The hardness, modulus, microstructure, structure and bond formation with different nitrogen contents during the deposition were studied by nanoindentation, scanning electron microscope, X‐ray diffraction and X‐ray photoelectron spectroscopy, respectively. The oxidation kinetics of Ti–Si–B–C–N was investigated. The nitrogen incorporation during deposition influences different properties of the coating. Hardness and modulus decreased, and microstructure showed very fine grain presence, and film changes to fully amorphous because of incorporation of nitrogen in the film. Copyright © 2016 John Wiley & Sons, Ltd.