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An investigation of the effect of chlorinated solvents on surface characteristics of S‐65 beryllium
Author(s) -
Mallinson Christopher F.,
Kozlowski Samuel,
Harvey Ann,
Watts John F.
Publication year - 2016
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5912
Subject(s) - chlorobenzene , chemistry , dichloromethane , solvent , chloroform , chlorine , chloride , vapours , inorganic chemistry , distilled water , metal , beryllium , dimethylformamide , nuclear chemistry , organic chemistry , chromatography , neuroscience , biology , catalysis
Samples of S‐65 beryllium were vapour degreased using six chlorinated solvents and analysed by X‐ray photoelectron spectroscopy. Exposure to the solvent vapour is believed to result in the formation of inorganic chloride at the metal surface, which can act as a corrosion precursor. Exposure to chloroform, tetrachloroethene, pentachlorobenzene and chlorobenzene resulted in the greatest amounts of beryllium chloride formation (>0.8 at.%), while exposure to dichloromethane and 1,1‐dichloroethene produced the least (<0.5 at.%). Mechanical abrasion of the metal surface while submerged in chloroform resulted in a significant increase in inorganic chloride at the beryllium surface. Rinsing of the samples with distilled water, after exposure to solvent vapours, significantly decreased the amount of organic and inorganic chlorine on the samples but did not result in complete removal of these species. Copyright © 2016 John Wiley & Sons, Ltd.