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AuN films – structure and chemical binding
Author(s) -
Quintero J. H.,
Arango P. J.,
Ospina R.,
Mello A.,
Mariño A.
Publication year - 2015
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5766
Subject(s) - diffraction , x ray photoelectron spectroscopy , nitride , deposition (geology) , materials science , chemical vapor deposition , nitrogen , crystallography , binding energy , x ray crystallography , chemistry , analytical chemistry (journal) , nanotechnology , layer (electronics) , atomic physics , optics , nuclear magnetic resonance , physics , paleontology , organic chemistry , chromatography , sediment , biology
AuN films were produced on 304 stainless steel using an arc‐pulsed – assisted plasma physical vapor deposition system. The deposition was performed using an Au target in a nitrogen atmosphere at different pressures. The films were characterized using x‐ray photoelectron spectroscopy and x‐ray diffraction. A 398.1‐eV binding energy was observed and assigned to gold nitride species. The x‐ray diffraction patterns displayed a crystallographic structure that corresponded to the Au‐fcc phase with broad diffraction lines. The observed widening of the Bragg diffraction lines (rocking curves) can be attributed to the presence of interstitial nitrogen atoms in the Au‐fcc structure. Copyright © 2015 John Wiley & Sons, Ltd.