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Interface characterization of nitrogen plasma‐treated gate oxide film formed by RTP technology
Author(s) -
Choi JaeSung,
Park JeaGun
Publication year - 2015
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5750
Subject(s) - characterization (materials science) , nitrogen , interface (matter) , oxide , plasma , materials science , nanotechnology , analytical chemistry (journal) , engineering , chemistry , physics , composite material , environmental chemistry , metallurgy , nuclear physics , organic chemistry , capillary number , capillary action
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