Adsorption of formic acid on Si(111)7 × 7 at room temperature: a valence band photoemission and Si2p photodesorption study

Formic acid is the simplest of the carboxylic acids and a model adsorption system for several surfaces. In spite of the simple structure, formic acid reactivity and photoreactivity may be quite complex. In this paper, a study is presented on the deuterated formic acid adsorption on Si(111)7 × 7 at room temperature. The study is performed both by valence band photoemission and by photon‐stimulated desorption as a function of time and of photon energy in the 90–120 eV range. A primarily adsorption on rest atoms is found. This is verified by monitoring rest atoms and adatom intensity as a function of formic acid exposure. Further checks were made to control that surface adatoms were still free to react after the adsorption of formic acid. The photon stimulated desorption produces 5 single positively charged fragments: D + , O + , OD + CO + and CDO + . Possible fragmentation mechanisms are discussed. Copyright © 2014 John Wiley & Sons, Ltd.