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Argon cluster size‐dependence of sputtering yields of polymers: molecular weights and the universal equation
Author(s) -
Seah M. P.
Publication year - 2015
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5656
Subject(s) - sputtering , argon , cluster (spacecraft) , chemistry , polymer , atom (system on chip) , hydrogen , polystyrene , atomic physics , ion , cluster size , analytical chemistry (journal) , molecular physics , molecular dynamics , materials science , computational chemistry , thin film , physics , nanotechnology , organic chemistry , computer science , embedded system , programming language
An analysis is provided of the data of Cristaudo et al . for the sputtering yields of polystyrene and polymethylmethacrylate by argon cluster ion beams as a function of their molecular weight. This analysis is made using the universal sputtering equation of Seah to evaluate the effect of the end‐group density on the parameter A . This parameter is thought to be related to the average energy per atom (excluding hydrogen) to liberate fragments and it is shown that A decreases as the end‐group density rises in the manner expected. Equations are provided relating A to the molecular weight or the end‐group density that are obeyed for both materials. Copyright © 2014 Crown Copyright.