Argon cluster size‐dependence of sputtering yields of polymers: molecular weights and the universal equation | Zendy

Seah M. P. | Zendy

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Argon cluster size‐dependence of sputtering yields of polymers: molecular weights and the universal equation

Author(s) -

Seah M. P.

Publication year - 2015

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.5656

Subject(s) - sputtering , argon , cluster (spacecraft) , chemistry , polymer , atom (system on chip) , hydrogen , polystyrene , atomic physics , ion , cluster size , analytical chemistry (journal) , molecular physics , molecular dynamics , materials science , computational chemistry , thin film , physics , nanotechnology , organic chemistry , computer science , embedded system , programming language

An analysis is provided of the data of Cristaudo et al . for the sputtering yields of polystyrene and polymethylmethacrylate by argon cluster ion beams as a function of their molecular weight. This analysis is made using the universal sputtering equation of Seah to evaluate the effect of the end‐group density on the parameter A . This parameter is thought to be related to the average energy per atom (excluding hydrogen) to liberate fragments and it is shown that A decreases as the end‐group density rises in the manner expected. Equations are provided relating A to the molecular weight or the end‐group density that are obeyed for both materials. Copyright © 2014 Crown Copyright.

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