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Estimation of the real temperature of samples in IR cell using OH frequency of silica
Author(s) -
Yamazaki H.,
Shima H.,
Yoda E.,
Kondo J. N.
Publication year - 2015
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5654
Subject(s) - infrared , calibration , amorphous silica , analytical chemistry (journal) , amorphous solid , chemistry , sample (material) , infrared spectroscopy , materials science , mineralogy , optics , chromatography , chemical engineering , crystallography , organic chemistry , physics , quantum mechanics , engineering
The peak top frequency of the stretching vibration of hydroxyl (OH) groups on amorphous silica reversibly changes accompanied by the change of the sample in temperature under the constant concentration. Using this phenomenon, the estimation of the real temperatures of samples in infrared (IR) cell can be achieved. The temperatures measured from outside the cell are first calibrated to real ones. The OH frequency of silica can be correlated to the real temperature of the sample inside the cell via the calibration of the measured and the real temperatures of samples in each IR cell. Copyright © 2014 John Wiley & Sons, Ltd.