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Studies of degradation behaviors of poly (3‐hexylthiophene) layers by X‐ray photoelectron spectroscopy
Author(s) -
Seo Hyun Ook,
Jeong MyungGeun,
Kim KwangDae,
Kim Dae Han,
Kim Young Dok,
Lim Dong Chan
Publication year - 2014
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5557
Subject(s) - x ray photoelectron spectroscopy , valence (chemistry) , chemistry , non blocking i/o , spectral line , x ray , electronic structure , crystallography , analytical chemistry (journal) , nuclear magnetic resonance , computational chemistry , catalysis , organic chemistry , physics , astronomy , quantum mechanics
Degradation behaviors of poly(3‐hexylthiophene‐2,5‐diyl) (P3HT) layers on NiO in the presence of H 2 O at ambient pressure and dark conditions were studied using X‐ray photoelectron spectroscopy (XPS). Upon H 2 O exposure at 120 °C, partial oxidation of P3HT together with molecular water incorporation, but with the maintained local ring‐structure, were deduced by XPS. Valence band spectra of XPS evidenced that the partial oxidation of P3HT local structure could alter π ‐conjugation systems of P3HT layers, forming additional electronic states close to its original highest occupied molecular orbital. For comparison, P3HT surface was also exposed to O 2 , and no change in the S 2p and C 1s spectra was found by O 2 exposure at 120 °C, implying that H 2 O plays a major role at the initial stage of P3HT oxidation. Copyright © 2014 John Wiley & Sons, Ltd.