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Applications of AES, XPS and TOF SIMS to phosphor materials
Author(s) -
Swart H. C.,
Terblans J. J.,
Ntwaeaborwa O. M.,
Kroon R. E.,
Coetsee E.,
Nagpure I. M.,
Kumar Vijay,
Kumar Vinod,
Kumar Vinay
Publication year - 2014
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5393
Subject(s) - x ray photoelectron spectroscopy , auger electron spectroscopy , phosphor , analytical chemistry (journal) , mass spectrometry , dopant , electron spectroscopy , secondary ion mass spectrometry , chemical state , chemistry , valence (chemistry) , auger , chemical composition , materials science , atomic physics , chemical engineering , doping , environmental chemistry , physics , nuclear physics , optoelectronics , organic chemistry , chromatography , engineering
The important role of Auger electron spectroscopy (AES), X‐ray photo electron spectroscopy (XPS) and time of flight secondary ion mass spectrometry (TOF‐SIMS) to characterize different phosphor materials is pointed out with examples. AES is used to monitor surface reactions during electron bombardment and also to determine the elemental composition of the surfaces of the materials, while XPS and TOF‐SIMS are used for the surface chemical composition and valence state of the dopants. Copyright © 2014 John Wiley & Sons, Ltd.