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Influence of biofunctionalization process on properties of silicon oxynitride substrate layer
Author(s) -
Kalisz M.,
Szymańska M.,
Dębowska A. K.,
Michalak B.,
Brzozowska E.,
Górska S.,
Śmietana M.
Publication year - 2014
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5379
Subject(s) - silicon oxynitride , substrate (aquarium) , materials science , refractive index , silicon , chemical engineering , layer (electronics) , chemical vapor deposition , surface modification , volumetric flow rate , thin film , analytical chemistry (journal) , nanotechnology , silicon nitride , chemistry , optoelectronics , organic chemistry , oceanography , physics , quantum mechanics , geology , engineering
The paper presents investigations of the influence of chemically aggressive biofunctionalization process for histidine‐tagged proteins on thickness, optical and mechanical properties of silicon oxynitride (SiO x N y ) film, which is often used as substrate material for a number of biosensors. We discuss the biofunctionalization effect for a set of SiO x N y films deposited by the radio frequency plasma‐enhanced chemical vapour deposition method with various N 2 O/(SiH 4 + NH 3 ) gas flow rate. It has been found that as an effect of biofunctionalization procedure, the SiO x N y films increase both their refractive index and hardness. Moreover, films deposited with higher N 2 O flow, which are softer and show lower refractive index, may slightly reduce their thickness as a result of the biofunctionalization process, but their surface favours more formation of on them protein biofilm than on films obtained with lower concentration of N 2 O. Copyright © 2014 John Wiley & Sons, Ltd.
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