Premium
XPS and AFM characterization of aminosilanes with different numbers of bonding sites on a silicon wafer
Author(s) -
Jakša G.,
Štefane B.,
Kovač J.
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5311
Subject(s) - x ray photoelectron spectroscopy , wafer , silicon , characterization (materials science) , layer (electronics) , oxide , silicon oxide , chemical engineering , chemistry , reactivity (psychology) , nanotechnology , materials science , organic chemistry , medicine , silicon nitride , alternative medicine , pathology , engineering
The aim of this work was the preparation and characterization of a silicon surface modified by different self‐assembled aminopropylsilanes with the purpose of using them in sensor applications. Single‐crystal silicon wafers (111) were modified with aminosilanes that have different numbers of bonding sites: 3‐aminopropyltrimethoxysilane (APTMS), 3‐aminopropyldiethoxymethylsilane (APRDMS) and 3‐aminopropylethoxydimethylsilane (APREMS). We deposited the self‐assembled layers from a solution of aminosilanes in toluene under various reaction conditions. The surface composition and the chemical bonding were determined using X‐ray photoelectron spectroscopy. Furthermore, the surface morphology was investigated using atomic force microscopy. Our results show that the reactivity with the Si‐oxide layer and the polymerization of aminosilanes depend on the number of possible bonding sites. The APTMS reacted the most intensively with the Si‐oxide layer; a less intensive reaction was observed for the APRDMS; and the least intensive reaction was observed for the APREMS. Copyright © 2013 John Wiley & Sons, Ltd.