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Influence of oxygen flow rate on the surface chemistry and morphology of radio frequency (RF) magnetron sputtered zinc oxide thin films
Author(s) -
AlKuhaili M. F.,
Durrani S. M. A.,
Bakhtiari I. A.
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5289
Subject(s) - oxygen , thin film , sputter deposition , crystallite , zinc , microstructure , oxide , deposition (geology) , cavity magnetron , surface roughness , volumetric flow rate , chemical engineering , chemistry , analytical chemistry (journal) , materials science , sputtering , nanotechnology , metallurgy , composite material , environmental chemistry , organic chemistry , paleontology , physics , quantum mechanics , sediment , biology , engineering
Zinc oxide thin films were deposited, by radio frequency magnetron sputtering, on heated and unheated substrates. The oxygen flow rate was varied during deposition, and its effects on the structural and chemical properties of the films were investigated. The films had oriented c‐axis growth with nano‐crystallite size. Their surfaces manifested columnar microstructure, with a surface roughness that was suppressed by the introduction of oxygen. Chemical analysis showed that deposition under an oxygen atmosphere resulted in substantial reduction of oxygen vacancies, with a corresponding incorporation of chemisorbed species. Copyright © 2013 John Wiley & Sons, Ltd.