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Lower friction and higher wear resistance of fluorine‐incorporated amorphous carbon films
Author(s) -
Cui Jinfeng,
Qiang Li,
Zhang Bin,
Yang Tao,
Zhang Junyan
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5283
Subject(s) - amorphous carbon , carbon film , fluorine , amorphous solid , chemical vapor deposition , materials science , carbon fibers , tribology , plasma enhanced chemical vapor deposition , chemical engineering , thin film , analytical chemistry (journal) , composite material , nanotechnology , chemistry , crystallography , organic chemistry , metallurgy , composite number , engineering
Plasma‐enhanced chemical vapor deposition was employed to fabricate hydrogenated amorphous carbon (a‐C:H) films and fluorine‐doped hydrogenated amorphous (a‐C:H:F) carbon films. For comparison purpose, the a‐C:H films were treated with CF 4 plasma. The bonding structure and tribological behavior of the films were investigated. The results indicate that the F presented mainly in the forms of C–F 3 , C–F and C–F 2 groups in both the a‐C:H:F film and the surface CF 4 plasma processed hydrogenated amorphous carbon (F‐P‐a‐C:H) films. Moreover, the a‐C:H:F films, because of the transformation of sp 3 to sp 2 , possess a lower friction coefficient than that of the F‐P‐a‐C:H films. Copyright © 2013 John Wiley & Sons, Ltd.