Lower friction and higher wear resistance of fluorine‐incorporated amorphous carbon films | Zendy

Cui Jinfeng | Zendy; Qiang Li | Zendy; Zhang Bin | Zendy; Yang Tao | Zendy; Zhang Junyan | Zendy

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Lower friction and higher wear resistance of fluorine‐incorporated amorphous carbon films

Author(s) -

Cui Jinfeng,

Qiang Li,

Zhang Bin,

Yang Tao,

Zhang Junyan

Publication year - 2013

Publication title -

surface and interface analysis

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.52

H-Index - 90

eISSN - 1096-9918

pISSN - 0142-2421

DOI - 10.1002/sia.5283

Subject(s) - amorphous carbon , carbon film , fluorine , amorphous solid , chemical vapor deposition , materials science , carbon fibers , tribology , plasma enhanced chemical vapor deposition , chemical engineering , thin film , analytical chemistry (journal) , composite material , nanotechnology , chemistry , crystallography , organic chemistry , metallurgy , composite number , engineering

Plasma‐enhanced chemical vapor deposition was employed to fabricate hydrogenated amorphous carbon (a‐C:H) films and fluorine‐doped hydrogenated amorphous (a‐C:H:F) carbon films. For comparison purpose, the a‐C:H films were treated with CF 4 plasma. The bonding structure and tribological behavior of the films were investigated. The results indicate that the F presented mainly in the forms of C–F 3 , C–F and C–F 2 groups in both the a‐C:H:F film and the surface CF 4 plasma processed hydrogenated amorphous carbon (F‐P‐a‐C:H) films. Moreover, the a‐C:H:F films, because of the transformation of sp 3 to sp 2 , possess a lower friction coefficient than that of the F‐P‐a‐C:H films. Copyright © 2013 John Wiley & Sons, Ltd.

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