Premium
Electron field emission of iron and cobalt‐doped DLC films fabricated by electrochemical deposition
Author(s) -
Ling Xiaoming,
Zhang Peizeng,
Li Ruishan,
Fan Duowang,
Yao Xiaoming
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5186
Subject(s) - cobalt , materials science , nanocrystalline material , field electron emission , amorphous solid , amorphous carbon , doping , diamond like carbon , nanocomposite , carbon fibers , electrochemistry , deposition (geology) , chemical engineering , nanotechnology , analytical chemistry (journal) , thin film , metallurgy , electrode , electron , composite material , chemistry , optoelectronics , composite number , crystallography , engineering , biology , paleontology , chromatography , quantum mechanics , physics , sediment
Using a simple electrochemical depositing process, iron and cobalt‐doped diamond‐like carbon (DLC) films were deposited on Si (100) substrates. The results showed that metallic elements were inhomogeneously doped into highly cross‐linking amorphous carbon matrix, forming the typical nanocrystalline/amorphous nanocomposite structure, and simultaneously the microsturcture of amorphous carbon was changed by the doping of metals. Field emission performance showed that the incorporation of iron and cobalt effectively decreases the threshold field from 13.5 V/µm to 8.0 V/µm and 6.5 V/µm, respectively, and a highest current density of the Co‐DLC film was about 1.2 mA/cm 2 at the electric field of 23.5 V/µm. Copyright © 2012 John Wiley & Sons, Ltd.