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Organic ion yield enhancement in secondary ion mass spectrometry using water vapour injection
Author(s) -
Mouhib T.,
Delcorte A.,
Poleunis C.,
Bertrand P.
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5043
Subject(s) - chemistry , yield (engineering) , ion , analytical chemistry (journal) , secondary ion mass spectrometry , deuterium , protonation , water vapor , mass spectrometry , static secondary ion mass spectrometry , chromatography , organic chemistry , atomic physics , materials science , metallurgy , physics
The effects of water (H 2 O) and deuterated water (D 2 O) vapour, injected closely to the analyzed surface at relatively high pressure, on the enhancement of the ion yield in secondary ion mass spectrometry (SIMS) was investigated for a set of organic samples. The results show that the same signal enhancements occurred either upon Ga + or C 60 + bombardment. In addition, the increase of H 2 O vapour pressure during the bombardment causes a specific enhancement of the protonated ion intensity. For instance, the presence of H 2 O vapour induces an enhancement by one order of magnitude of the [M + H] + static SIMS intensity for the antioxidant Irgafos 168 and by more than two times for the amino acids. Copyright © 2012 John Wiley & Sons, Ltd.