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Ultra low energy O 2 + SIMS depth profiling of superficial poly(CuPc) and Co(II)T(o‐NH2)PP monomolecular layers
Author(s) -
Dowsett M. G.,
Morris R. J. H.,
Adriaens A.,
Wilson N. R.
Publication year - 2013
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5039
Subject(s) - monolayer , analytical chemistry (journal) , cobalt , copper , silicon , porphyrin , sputtering , chemistry , phthalocyanine , layer (electronics) , ion , materials science , thin film , nanotechnology , inorganic chemistry , photochemistry , chromatography , organic chemistry
Using an O 2 + beam at 90 eV, close to the sputtering threshold, we have obtained depth profiles from superficial monolayers on gold. The samples were polymeric copper phthalocyanine (poly(CuPc)) (C 32 H 12 N 8 Cu) n and Co(II)T(o‐NH 2 )PP (5,10,15,20‐tetrakis‐(2‐aminophenyl) porphyrin‐cobalt(II)) (C 44 H 28 CoN 4 ) monomolecular layers, deposited on gold films on silicon. The layer thicknesses, determined using atomic force microscopy, were ~4.5 nm for the poly(CuPc) and ~1.8 nm for the Co(II)T(o‐NH2)PP. The ion signals monitored included: poly(CuPc) layer: 63 Cu + , 65 Cu + , 30 ON + and 12 C + ; Co(II)T(o‐NH2)PP layer: 59 Co + , 30 ON + and 12 C + . Comparisons between 90 eV and 235 eV profiles from the layers and bare substrates showed that the monomolecular layers are resolvable at 90 eV and distinct from any surface contamination spike. Copyright © 2012 John Wiley & Sons, Ltd.