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Nanotribological behavior of thermal treatment of zinc titanate thin films
Author(s) -
Wu ShyhChi,
Yau WeiHung,
Tsai ChienHuang,
Chou ChangPin
Publication year - 2012
Publication title -
surface and interface analysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.52
H-Index - 90
eISSN - 1096-9918
pISSN - 0142-2421
DOI - 10.1002/sia.5019
Subject(s) - x ray photoelectron spectroscopy , crystallinity , materials science , amorphous solid , thin film , analytical chemistry (journal) , thermal treatment , rutile , phase (matter) , nanotechnology , chemical engineering , crystallography , chemistry , composite material , chromatography , engineering , organic chemistry
We present a study of the nanotribological behavior of ZnTiO 3 films; the surface morphology, stoichiometry, and friction ( μ ) were analyzed using atomic force microscopy, X‐ray photoelectron spectroscopy, and nanoscratch system. It is confirmed that the measured values of H and μ of the ZnTiO 3 films were in the range from 8.5 ± 0.4 to 5.6 ± 0.4 GPa and from 0.164 to 0.226, respectively. It is suggested that the hexagonal ZnTiO 3 decomposes into cubic Zn 2 TiO 4 and rutile TiO 2 based on the thermal treatment; the H , μ , and R MS were changed owing to the grain growth and recovery that results in a relax crystallinity of ZnTiO 3 films. From X‐ray photoelectron spectroscopy measured, core levels of O 1 can attribute the weaker bonds as well as lower resistance after thermal treatment. The XRD patterns showed that as‐deposited films are mainly amorphous; however, the hexagonal ZnTiO 3 phase was observed with the ZnTiO 3 (104), (110), (116), and (214) peaks from 620 to 820 °C, indicating that there is highly (104)‐oriented ZnTiO 3 on the silicon substrate. Copyright © 2012 John Wiley & Sons, Ltd.
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